Liu, Qingyuan
MOP1016
Simulations and measurements of injection backgrounds at SuperKEKB
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SuperKEKB is an electron-positron collider providing beam to the Belle-II experiment. The design luminosity has not yet been achieved, partly due to limited injection efficiency in both rings, which limits the achievable beam current. In addition, the injection process generates significant background in the Belle-II detector, requiring vetoes during data taking that reduce the detector efficiency. In order to improve the understanding of these issues, the injection process at SuperKEKB has been simulated using the Xsuite simulation framework, including detailed multi-turn tracking and particle-matter interactions in the collimators. The results of these simulations have been used as input for a Belle-II detector simulation to estimate the resulting background levels. This paper presents the simulation methodology and the comparison with experimental data, collected during the 2025 run, as a prerequisite for future applications of the simulation framework including further optimization of the background at SuperKEKB as well as similar studies for future lepton colliders.
  • G. Nigrelli
    Istituto Nazionale di Fisica Nucleare, Laboratori Nazionali di Frascati, Sapienza University of Rome, European Organization for Nuclear Research
  • G. Broggi, J. Salvesen, K. Oide, R. Bruce, S. Redaelli
    European Organization for Nuclear Research
  • H. Koiso, H. Kaji, H. Nakayama, N. Iida, T. Mori, Y. Funakoshi, Y. Ohnishi
    High Energy Accelerator Research Organization
  • M. Boscolo
    Istituto Nazionale di Fisica Nucleare
  • M. Li
    Chinese Academy of Sciences, Laboratoire de Physique des 2 Infinis Irène Joliot-Curie
  • Q. Liu
    University of Hawaiʻi at Mānoa
  • T. Nemoto
    The University of Tokyo
Paper: MOP1016
DOI: reference for this paper: 10.18429/JACoW-IPAC2026-MOP1016
About:  Received: 12 May 2026 — Revised: 15 May 2026 — Accepted: 16 May 2026 — Issue date: 22 May 2026
Cite: reference for this paper using: BibTeX, LaTeX, Text/Word, RIS, EndNote